13-Apr-2023Source: AT Systems
AT Systems, LLC. announced today that the company has received an airworthiness release (AWR) in accordance with Army Regulation (AR) 70-62 for the ATS electronic helmet mounted degraded visual environment (DVE) hood on UH-60A/L/V and UH/ HH60M. The AT System DVE visor was designed, developed, and manufactured by current and former United States Army-trained standardization... Read more
10-Feb-2021Source: AT Systems
AT Systems patented device trains pilots for degraded visual environment conditions during routine training flights. This unique device is the latest technology in training for spatial disorientation and low visibility events such as Inadvertent IMC, brown-out, or white-out conditions. The NTSB has identified in aircraft spatial disorientation training as a key factor in preventing accidents... Read more
27-Aug-2020Source: AT Systems
AT Systems, LLC is proud to announce the start of the Airworthiness Release Process (AWR) as a part of the Cooperative Research and Development Agreement (CRADA) with the US Army Aeromedical Laboratory (USAARL) at Fort Rucker, AL. AT Systems has patented a device that trains pilots for degraded visual environment during normal training flights. This... Read more
11-Feb-2020Source: AT Systems
AT Systems announced it will begin taking pre-order reservations for its patented in-aircraft IIMC/UIMC training system starting March 1, 2020. After receiving overwhelming interest at Heli-Expo, AT Systems is excited to offer the revolutionary training system to the civilian market starting in October 2020. Full production is scheduled to begin mid-year. The innovative patented ATS... Read more
5-Feb-2020Source: AT Systems
AT Systems, LLC is proud to be invited to demonstrate new training technology at HeliExpo. AT Systems has patented a device that trains pilots for degraded visual environment during normal training flights. The device can be seen at the Safety Town Hall and in several exhibits. This totally unique device is the latest technology in... Read more
